Stand-Alone High Resolution Photolithography/Aligner.
Lumina series offers a high quality, reliable, and cost effective solution
for high-resolution, accurate alignment, contact and proximity
photolithography in electronic, optoe...
The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel
The POLOS 200 spin coaters can be manual or optional semi-automatic chemical dispense with clear/transparent flat top lid, with center hole. Seamless full-plastic housing in Natural Polypropylene. For fragments and substrates up t...
Suitable for coating applications. Small footprint designed for glove boxes.
- Speed : 100-12000rpm
- Substrates up to Ø150mm
- Up to 10 Customizable Spin Programs
NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with...
ANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate ...
NANO-MASTER’s NRE-4000 is a stand alone Reactive Ion Etching (RIE) system with showerhead gas distribution and water cooled RF platen. It has a stainless steel cabinet and a 13" cylindrical aluminum chamber that opens from the t...
NANO-MASTER’s NTE-3000 is a PC controlled tabletop Thermal Evaporation system with a wide range of applications in organic and metal evaporation. It is a 2kVA system utilizing SCR circuitry for accurate temperature control which...
The MSR rotating electrode is the most popular rotating electrode configuration worldwide. The MSR now includes both CE and ETL marks.
This flexible design may be used with Rotating Disk Electrodes (RDE), Rotating Ring-Disk Electr...