Stand-Alone High Resolution Photolithography/Aligner.
Lumina series offers a high quality, reliable, and cost effective solution
for high-resolution, accurate alignment, contact and proximity
photolithography in electronic, optoe...
The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel
The POLOS 200 spin coaters can be manual or optional semi-automatic chemical dispense with clear/transparent flat top lid, with center hole. Seamless full-plastic housing in Natural Polypropylene. For fragments and substrates up t...
Suitable for coating applications. Small footprint designed for glove boxes.
- Speed : 100-12000rpm
- Substrates up to Ø150mm
- Up to 10 Customizable Spin Programs
NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with...