Stand-Alone High Resolution Photolithography/Aligner.
Lumina series offers a high quality, reliable, and cost effective solution
for high-resolution, accurate alignment, contact and proximity
photolithography in electronic, optoe...
The low-cost SPIN150i spin coater is suitable for processing fragments as small as 5 mm up to Ø150 (or 6”) or 4" x 4" substrates. Detachable touchpanel
The POLOS 200 spin coaters can be manual or optional semi-automatic chemical dispense with clear/transparent flat top lid, with center hole. Seamless full-plastic housing in Natural Polypropylene. For fragments and substrates up t...
Suitable for coating applications. Small footprint designed for glove boxes.
- Speed : 100-12000rpm
- Substrates up to Ø150mm
- Up to 10 Customizable Spin Programs
NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with...
ANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate ...