View Enquiry List Yield Engineering
R&D Plasma Cleaning System The G1000 offers four shelves. This parallel capacitive system excels in plasma cleaning, stripping, and surface modification in 40 kHz or 13.56 MHz. Choose from five plasma modes. Anisotropic modes include RIE and active ion trap; isotropic modes include downstream (electron free), active and downstream ion trap.
Automated Plasma Resist Strip/Descum System The EcoClean is YES’s small-footprint, high-throughput downstream plasma strip/descum solution, with high etch rate and no/negligible damage to surfaces. Minimize cost of ownership, gas usage, and valuable fab space.
Automated Vacuum Cure System for Polyimide/BCB/PBO/Low Temp Polymers Faster than atmospheric process with >60% higher throughput 2-3X lower cost of ownership, 1.6-2x less N2 consumption and >98% uptime More complete cure (5X less outgassing) 5-zone temperature control with < 1.0% uniformity Laminar flow for excellent particle performance Active heating and cooling for variable ramp-up and ramp-down Accommodates 50 – 100 wafers
