Brands

Nanonex

Total: 3 items
NX-2600/2600BA, Full-Wafer Imprintor with Alignment and Photolithography

Nanonex utilizes patented Air Cushion PressTM to ensure maximum nanoimprint unformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes. The full-wafer imprinting scheme enables a high processing throughput.

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Nanonex Lumina-200 Mask Aligner

Stand-Alone High Resolution Photolithography/Aligner. Lumina series offers a high quality, reliable, and cost effective solution for high-resolution, accurate alignment, contact and proximity photolithography in electronic, optoelectronic, MEMS, and many other applications. It has a user friendly interface, high precision stages, high performance optics, and small foot print.

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