Brands

NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.

ANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate up to 8" wafers and can be biased with RF, Pulsed DC or DC while being heated up to 800°C resistively or with IR lamps. The chamber is evacuated to 5x10-7 Torr pressure range using 250 l/sec turbo molecular pump backed with 5 cfm mechanical pump. The system utilizes LabVIEW PC control for full automation.

NANO-MASTER’s NRE-4000 is a stand alone Reactive Ion Etching (RIE) system with showerhead gas distribution and water cooled RF platen. It has a stainless steel cabinet and a 13" cylindrical aluminum chamber that opens from the top for wafer loading. It can accept up to 8" (200 mm) wafers.

NANO-MASTER’s NTE-3000 is a PC controlled tabletop Thermal Evaporation system with a wide range of applications in organic and metal evaporation. It is a 2kVA system utilizing SCR circuitry for accurate temperature control which is crucial when evaporating organic materials. It is designed with extreme care to achieve clean, uniform, and reproducible processes on a small footprint. It provides low cost, high quality capabilities for demanding applications in R&D and low scale manufacturing.