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Material Science & Nanotechnology
Photoresist and Polyimide Coating System
SPT200
Ultrasonic spray of photoresist for MEMS wafers and other substrates with varying topographies
Brand: SonoTek
Available
Free delivery within Singapore only
A simple, economical and repeatable process for photoresist coatings in photolithography wafer processing with fine control of flow rate, coating speed, and deposition amount using an advanced layering technique.
- Uniform thin film coverage of various surface profiles.
- Capable of coating high aspect ratio trenches with excellent uniformity.
- Non-clogging atomized spray.
- Ability to deposit thin single micron layers with high uniformity.
- Repeatable proven spray process.
Basic Specifications
| DIMENSIONS: 1066mm W x 1765 mm H x 1095 mm D (42” W x 70” H x 43” D) |
| WORK AREA: 465 mm x 465 mm x 100 mm (19.7” x 19.7” x 3.9”) |
| CONTROL: Windows-based (pc included 19-inch touch screen interface) |
| POWER REQUIREMENTS: 208-240VACc, 16A max, 50/60 Hz 1 phase (L,N,G) or (L1, L2, G) |
| AIR: 551.6 kPa (80PSI) 1 compressed air, 1 nitrogen |
| MOTORS: Brushless DC Servo |
| CERTIFICATION: CE |
| ULTRASONIC NOZZLE DESIGNS: Vortex, AccuMist, Impact |
Specification :
| Specifications | Kindly refer to the "Product Overview" tab. |
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