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SWC-3000 Single Wafer Cleaning Systems
NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
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Features
- 12" OD, 7" x 7" substrates
- Table top unit
- Venturi powered vacuum
- Damage free megasonic
- Independent chemical dispenses
- Spin dry with heated N2
- Microprocessor controlled
- Chemical dispense unit
- Safety interlocks
- 19”x26” footprint
- Four 3.8L HDPE canisters
- Stand alone unit
- Dual drain for acids and solvents
- Suck back valves to prevent drips
