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NX-2600/2600BA, Full-Wafer Imprintor with Alignment and Photolithography
Nanonex utilizes patented Air Cushion PressTM to ensure maximum nanoimprint unformity. The unique Smart Sample Holder design allows the handling of samples of different sizes and irregular shapes. The full-wafer imprinting scheme enables a high processing throughput.
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Specifications
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Full-wafer (up to 8") nanoimprinting tool |
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All forms of nanoimprint and high resolution photolithography |
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Patented Air Cushion PressTM (ACP) for ultimate nanoimprint uniformity |
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Sub-micron overlay alignment accuracy and optical backside alignment (NX-2600BA) |
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User friendly alignment scheme |
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Smart Sample Holder for handling different sizes and irregular shapes |
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Applications in opto, displays, biotechnologies, data storage, materials, ..., etc |
