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NRE-4000 - RIE System
NANO-MASTER’s NRE-4000 is a stand alone Reactive Ion Etching (RIE) system with showerhead gas distribution and water cooled RF platen. It has a stainless steel cabinet and a 13" cylindrical aluminum chamber that opens from the top for wafer loading. It can accept up to 8" (200 mm) wafers.
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Features
- 13” aluminum hard anodized chamber
- Showerhead gas distribution
- Up to 200mm substrates
- MFC’s with SS gas lines
- DC Bias: up to -500V self bias, up to -1000V external bias
- Automatic pressure control
- 600W RF power supply with auto tuner
- Water cooled or heated (400°C) platen
- 250l/sec corrosive turbomolecular pump with suitable backing pump
- Fully automated PC based, recipe driven
- LabVIEW user interface
- Fully safety interlocked
