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Nanonex Lumina-200 Mask Aligner
Stand-Alone High Resolution Photolithography/Aligner. Lumina series offers a high quality, reliable, and cost effective solution for high-resolution, accurate alignment, contact and proximity photolithography in electronic, optoelectronic, MEMS, and many other applications. It has a user friendly interface, high precision stages, high performance optics, and small foot print.
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Key Features
- High Resolution
- Photolithography
- High Precision Alignment Stages
- State-of-the-Art Alignment Optics
- Precise Gap Control
- User Friendly PC Control
- Small Footprint
- Cost Effective Design
- Backside Alignment Available as Option
Applications
- Semiconductor Devices
- MEMS
- Optoelectronics
- Advanced Packaging
- Power Devices
