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Nanotechnology
 

      


















 
Spin Coater/Processor/Developer

The versatile, all plastic, single substrate spin processors are specifically designed for applications for MEMS, R&D and typically low volume applications. Spin developing, spin etching, rinse / cleaning, spin drying.

 

The single substrate spin processors are perfectly suitable for a wide range of applications, including drying, rinsing,cleaning, coating. All of our spin coaters are also available in indeck version.

Manual Dispense

POLOS SPIN 150i-NPP

  • For up tp 6" (150mm) Wafers
  • For up to 4" x 4" (100mm) Substrates
  • Material: Natural Polypropylene (NPP)
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • CW & CCW Rotation
  • Colour Touchscreen with Customisable Icons
  • USB ports

POLOS SPIN 200i-NPP

  • For up to 8" (200mm) Wafers
  • For up to 6" x 6" (150mm) Substrates
  • Material: Natural Polyproylene (NPP)
  • 12.000 RPM (Depending on Substrate / Chuck)
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • CW & CCW Rotation
  • Colour Touchscreen with Customisable Icons
 

POLOS 300 Advance

Single Substrate Spin Processor, Desktop version, Material NPP (High grade Natural Polypropylene, tool body and all wetted surfaces), for substrates up to 300 mm diameter, automatic chemical dispense, heavy duty motor, including:

  • 3 Programmable Dry Relays, nominal switching capacity 0.5A / 125 VAC - 0.3A / 60DC
  • 1 x Vacuum Chuck A-V87-S96-NPP-HD
  • CW & CCW & Puddle Rotation
  • Colour Touchscreen with Customisable Icons
  • USB Port
 

























 

Fully Automatic Dispense

Cleaning

  • Spin processor for spin cleaning and drying
  • Full-Plastic enclosure in Natural Polypropylene (NPP)
  • Linear movable arm for direct spray among all substrate surface with both High Pressure and Megasonic jets.
  • Integrated High Presure Scrubber Jet up to 200 Bar
  • Interchangeable high pressure spray tips feature feathered spray pattern edges to deliver a uniform coverage
  • Equipped with Megasonic cleaner spot shower with adjustable flow and power output
  • Hot DI-Water rinsing system with 3.5kW PFA coated Bath Heating System suitable for high-purity fluids
  • Substrate Front & Back Side In Situ Di Water Rinse
  • Integrated CO2 bubbler
  • Nitrogen dry through dome or movable arm
  • For substrate up to Ø 300 mm
  • Closed chamber with Transparent Lid for easy process control

Coating & Developing

  • Compact integrated solution in single cabinet:Full-Plastic enclosure with 20mm thick wall in Natural Polypropylene (NPP),Closed chamber with Transparent Lid for easy process control,DI-water and Nitrogen spray guns Located in handy position to facilitate cleaning of the chamber,Safe liquid sensor(s) for leakage and choked drain detection,Exhaust presence monitoring system
  • Coater equipped with:Fully automated dosing pump,Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface,Front and back side adjustable Edge Bead Removal,Nitrogen dry optionally available through lid or movable arm,Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
  • Developer equipped with:Fully automated top spray developing system with double contained lines,HD drive suitable for chemical saver “puddle” developing,Developer dispensed through dispense vessel,Substrate Front & Back Side In Situ Di Water Rinse with manually adjustable flow rate,Combined chamber rinse and purge system for safe access to process chamber,Selectable drain line with integrated drain canister for waste collecting

Etching System

  • Spin processor for spin etching with controllable flow rate and mixture ratio
  • Linear movable dispense arm with multiple dispensing and spraying lines
  • HD motor drive suitable for chemical saver “puddle” etching
  • Highly accurate Per step programmable flow rate and mixing ratio
  • Suitable for static or dynamic dispensing among all substrate surface
  • Nitrogen dry optionally available through dome or movable arm
  • Substrate Front & Back Side In Situ Di Water Rinse
  • Full-Plastic enclosure in Natural Polypropylene (NPP)


 
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